8 Facts About Electron Beam Evaporation

Electron beam evaporation

 

Electron beam evaporation, also known as E-beam evaporation, occurs when a target material is blasted with an electron beam that is given off by a tungsten filament under a high vacuum. Electron beam evaporation is used at ZC&R Coatings for Optics and Abrisa Technologies. This process is not the most commonly used procedure, but it does have several uses and there are several little known facts about E-beam evaporation.

Schematic diagram of e-Beam evaporation

Electron Beam Evaporation Facts

 

Here are 8 electron evaporation facts listed below:

1. The deposition rate in electron beam evaporation can be as low as 1 nanometer per minute and as high as 2 micrometers per minute.
2. It is wear resistant and has thermal barrier coatings, making it ideal for aerospace industries.
3. The hard coatings are ideal for cutting and tool industries.
4. The electronic and optical films created in the E-beam evaporation process are great for thin film solar applications and within the semiconductor industries.
5. Electron beam evaporation is a line of sight deposition process and when performed at a low pressure.
6. The inner surface of complex geometries cannot be coated, only the outer surface because of the translational and rotational motion of the shaft.
7. Non-uniform evaporation rate can occur due to the filament degradation within the electron gun.
8. Scattering of the vapor cloud takes place when vapor deposition is performed a higher pressure. This means that the surfaces not in sight of the source can be coated.